期刊
THIN SOLID FILMS
卷 517, 期 10, 页码 3178-3182出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2008.11.092
关键词
HPPMS; HIPIMS; ITO; Low-E
In this study, indium tin oxide (ITO) films were prepared by high power pulse magnetron sputtering [D. J. Christie, F. Tomasel, W. D. Sproul, D. C. Carter, J. Vac. Sci. Technol. A, 22 (2004) 1415. [1]] without substrate heating. The ITO films were deposited from a ceramic target at a deposition rate of approx. 5.5 nm*m/min W. Afterwards, the ITO films were covered with a siliconoxynitride film sputtered from a silicon alloy target in order to prevent oxidation of the ITO film during annealing at 650 degrees C for 10 min in air. The optical and electrical properties as well as the texture and morphology of these films were investigated before and after annealing. Mechanical durability of the annealed films was evaluated at different test conditions. The results were compared with state-of-the art Fro films which were obtained at optimized direct current magnetron sputtering conditions. (C) 2008 Elsevier B.V. All rights reserved.
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