Protection of polymer from atomic-oxygen erosion using Al2O3 atomic layer deposition coatings

Thin films of Al2O3 grown using atomic layer deposition (ALD) techniques can protect polymers from erosion by oxygen atoms. To quantify this protection, polyimide substrates with the same chemical repeat unit as Kapton (R) were applied to quartz crystal microbalance (QCM) sensors. Al2O3 ALD films with varying thicknesses were grown on the polyimide substrates. The ALD-coated polyimide materials were then exposed to a hyperthermal atomic-oxygen beam. The mass loss versus oxygen-atom exposure time was measured in situ by the QCM. Al2O3 ALD film thicknesses of similar to 3 5 angstrom were found to protect the polymer from erosion. (C) 2007 Elsevier B.V. All rights reserved.