期刊
THIN SOLID FILMS
卷 517, 期 3, 页码 1027-1031出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2008.06.047
关键词
ZuO; GZO; TCO; EMI; Glass; Ion planting
Low-sheet-resistance Ga-doped ZnO films with thickness between about 0.3 and 2 mu m were prepared on glass substrates by ion-plating system, which can be also deposited on large-area substrate with a size of 1 m(2). The electromagnetic interference (EMI) shielding effectiveness and transparency of the films were investigated. Hall effect measurements showed that a decrease in resistivity with thickness causes an effective decrease in sheet resistance of the films. With decreasing sheet resistance, the EMI shielding effectiveness of the films at a frequency of 2.45 GHz increased, and the highest shielding effectiveness was 47.4 dB. All of the films demonstrated visible transmission of more than 70%. (C) 2008 Elsevier B.V. All rights reserved.
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