期刊
THIN SOLID FILMS
卷 516, 期 5, 页码 810-813出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2007.06.179
关键词
catalytic chemical vapor deposition; ion bombardment; titanium oxide; X-ray photoelectron spectroscopy (XPS); optical properties; conductivity
The effects of nitrogen ion bombardment on TiO2 films prepared by the Cat-CVD method have been studied to improve the optical and electrical properties of the material for use in Si thin film solar cells. The refractive index n and the dark conductivity of the TiO2 film increased with irradiation time. The refractive index n of the TiO2 film was changed from 2.1 to 2.4 and the electrical conductivity was improved from 3.4 x 10(-2) to 1.2 x 10(-1) S/cm by the irradiation. These results are due to the formation of Ti-N bonds and oxygen vacancies in the film. (c) 2007 Elsevier B.V. All fights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据