4.4 Article

Comparison of sulfur interaction with hydrogen on Pt(111), Ni(111) and Pt3Ni(111) surfaces:: The effect of intermetallic bonding

期刊

SURFACE SCIENCE
卷 602, 期 16, 页码 2752-2757

出版社

ELSEVIER SCIENCE BV
DOI: 10.1016/j.susc.2008.06.035

关键词

density functional calculations; catalysis; adsorption; hydrogen; sulfur; platinum; nickel; platinum-alloy

资金

  1. National Research Council

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Adsorption strengths of hydrogen and sulfur both individually and together as co-adsorbates were investigated on Pt(111), Ni(111) and Pt3Ni(111) surfaces using density functional theory in order to determine the effect of metal alloying on sulfur tolerance. The adsorption strengths of H and S singly follow the same trend: Ni(111) > Pt(111) > Pt3Ni(111), which correlates well with the respective d-band center positions of each surface. We find that the main effect of alloying is to distort both the sub-layer structure and the Pt overlayer resulting in a lowered d-band. For all three surfaces, the cl-band shifts downward non-linearly as a function of S coverage. Nearly identical decreases in d-band position were calculated for each surface, leading to an expectation that subsequent adsorption of H would scale with Surface type similarly to single species adsorption. in contradiction to this expectation, there was no clearly discernable difference between the energies of coadsorbed H on Pt(111) and Ni(111) and only a slightly lowered energy on Pt3Ni(111). This provides evidence that coadsorbed species in close proximity interact directly through itinerant mobile electrons and through electrostatic repulsion rather than solely through the electronic structure of the surface. The combination of the lowered d-band position (arising from distorted geometry) and direct co-adsorbate interactions on Pt3Ni(111) leads to a lower energy barrier for H2S formation on the surface compared to pure Pt(111). Thus, alloying Pt with Ni both decreases the likelihood of S adsorption and favors S removal through H2S formation. (C) 2008 Elsevier B.V. All rights reserved.

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