期刊
SURFACE & COATINGS TECHNOLOGY
卷 242, 期 -, 页码 237-245出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2013.12.002
关键词
Upscaling; Cold plasmas; Technological parameters
资金
- Alexander von Humboldt Foundation
The technological parameters that control plasma processes follow several scaling rules. Hence, we must adapt inlet gas flow rate, pressure, input power and excitation frequency to the new reactor dimensions. High rates of film deposition or etching; plasma homogeneity, and reproducibility are the main objectives in any attempt to upscaling. This paper provides guidelines to transfer plasma deposition processes from small pilot reactors to large plants for industrial production. (C) 2013 Elsevier B.V. All rights reserved.
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