期刊
SURFACE & COATINGS TECHNOLOGY
卷 232, 期 -, 页码 600-605出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2013.06.035
关键词
Cell-like nanostructure; V-Si-N coatings; RF-DC-coupled Si source; HRTEM; Sputtering
资金
- Chinese Academy of Sciences
- China Postdoctoral Science Foundation [2011 M501031]
By using reactive magnetron co-sputtering deposition, we prepared V-Si-N coatings from a pulsed-DC-excited vanadium source and an RF-DC-coupled Si source. The process was run at 773 K under a relatively high partial pressure of nitrogen (0.3 Pa) and generated intense ion bombardment at the substrate (J(i)/J(Me) similar to 4.5). These favorable process conditions led to the formation of dense and smooth V-Si-N coatings with high hardness values (>33 GPa). We performed high-resolution transmission electron microscopy (HRTEM) studies for the coating with 5.5 at.% Si and identified a cell-like nanostructure, in which nanocrystalline VN grains were encapsulated by <1-nm-thick silicon nitride layers. This cell-like nanostructure, together with an extremely dense and featureless growth structure, rendered the 5.5 at.% Si coating >50 GPa nanoindentation hardness and >80% elastic recovery. (C) 2013 Elsevier B.V. All rights reserved.
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