期刊
SURFACE & COATINGS TECHNOLOGY
卷 229, 期 -, 页码 222-225出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2012.03.075
关键词
Magnetron sputtering; Large areas; Uniformity
资金
- National Natural Science Foundation of China [51072039, 50972031]
- Program for New Century Excellent Talents in University [NCET-10-0070]
- Ph.D. Programs Foundation of Ministry of Education of China [20112302110036]
To grow uniform films on a large substrate by magnetron sputtering with a small target, a new theoretical model has been proposed, implemented and confirmed. The model was based on a magnetron sputtering system containing a rotation substrate holder and a step-moving target. There were two critical parameters, namely the target stay time and the target moving step, affecting film thickness distribution in this model. The relationship between the thickness distribution and the parameters was obtained. The simulated results showed that when the target stay time was proportional to the target scanning area at the rotating substrate, the film thickness was more uniform than other conditions. The deviation of film thickness distribution decreased with a decrease in target moving step. A magnetron sputtering system containing a rotation substrate holder and an Phi 50 mm step-moving target has been established by us. When target stay time was proportional to the target scanning area at the rotating substrate and target moving step was 5 mm, the relative deviation of film thickness distribution was less than 5% within a diameter of Phi 300 mm. The numerical results agreed well with measurements, which demonstrated that our model was applicable to depositing large uniform film. It was expected that our model was also applicable to magnetron sputtering systems with other dimensions. (C) 2012 Elsevier B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据