期刊
SURFACE & COATINGS TECHNOLOGY
卷 230, 期 -, 页码 46-50出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2013.06.010
关键词
Silicon oxynitride; Waveguide; PECVD
资金
- Smart Mix Programme of the Netherlands Ministry of Economic Affairs
- Netherlands Ministry of Education, Culture and Science
Silicon oxynitride films were deposited at 150 degrees C using inductively coupled plasma enhanced chemical vapor deposition, aiming towards low-temperature fabrication of waveguide material with low optical losses in the visible and near-infrared range. The influence of the deposition parameters such as SiH4 fraction, deposition pressure and Ar/N-2 ratio on the film properties was experimentally investigated using spectroscopic ellipsometry, X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. These findings were consistent with the chemical modeling of gas-phase composition of the plasma thereby leading to better understanding of the deposition process. (C) 2013 Elsevier B.V. All rights reserved.
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