A thick TiN/TiCN multilayer film by DC magnetron sputtering

A thick TiN/TiCN multilayer film was prepared on steel and silicon (Si) substrates using a DC magnetron sputtering technique under a high deposition rate. Its thickness reached about 23.5 mu m and it was composed of 30 bilayer numbers. X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), cross-sectional high resolution transmission electron microscopy (HRTEM) and field emitted scanning electron microscopy (FESEM) were employed to characterize the composition and structure of the film on the Si substrates. It was found that the inner TiCN layers consisted of a mixture nanocrystalline TiCN phase and amorphous carbon, and the TiN layers showed nano-columnar structure. The adhesion force and the hardness of the film deposited on steel substrates were 29.0 N and 21.4 GPa, respectively. It was revealed that the thick film still maintained the excellent mechanical properties. The film sliding against steel ball had good wear resistance and very long service life (>11 h) in ambient air under high rotate speed and large load. (C) 2012 Elsevier B.V. All rights reserved.