期刊
SURFACE & COATINGS TECHNOLOGY
卷 205, 期 21-22, 页码 5088-5092出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2011.05.017
关键词
Atomic layer deposition; Barrier; Packaging material; Recyclability; Aluminum oxide; Biopolymer
资金
- VTT
- Academy of Finland [126528]
- Academy of Finland (AKA) [126528, 126528] Funding Source: Academy of Finland (AKA)
Thin (25 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of 80 and 100 degrees C onto various bio-based polymeric materials employing the atomic layer deposition (ALD) technique. The work demonstrates that the ALD-grown Al2O3 coating significantly enhances the oxygen and water vapor barrier performance of these materials. Promising barrier properties were revealed for polylactide-coated board, hemicellulose-coated board as well as various biopolymer (polylactide, pectin and nano-fibrillated cellulose) films. (C) 2011 Elsevier B.V. All rights reserved.
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