期刊
SURFACE & COATINGS TECHNOLOGY
卷 204, 期 21-22, 页码 3436-3442出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2010.04.001
关键词
Reactive RF magnetron sputtering; TiO2; Photo-induced hydrophilic; Oxygen flow ratio; Self cleaning
资金
- LG. Chem. Ltd. [2008-8-1403]
TiO2 thin films were deposited by reactive radio frequency magnetron sputtering of Ti target at low working pressure (1 mTorr) and various O-2 and Ar flow ratios (R-O2 = O-2/(O-2 + Ar)). Properties of TiO2 films were measured by field emission scanning electron microscopy, atomic force microscopy, X-ray diffractometry, UV-VIS transmission spectroscopy, X-ray photoelectron spectroscopy and evaluated by contact angle analysis. Well defined columnar structure with rough surface was obtained at relatively lower R-O2. As R-O2 increased, the oxygen vacancies in the films decreased and the stoichiometric ratio of O/Ti changed from 1.79 to 1.98. Transition from anatase to rutile phase was observed with increase in R-O2. The optical bandgap showed a red shift with increase in R-O2. In addition, the film with co-existing of rutile and anatase showed a high Urbach tail. Lower R-O2 resulted in higher photo-hydrophilicizing efficiency due to the change in morphology, structure and composition. However, very low R-O2 (less than 10%), which led to transition mode, resulted in poor photo-hydrophilicizing efficiency. (C) 2010 Elsevier B.V. All rights reserved.
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