Nanocrystalline titanium nitride films prepared by electrophoretic deposition

Homogeneous and adhesive nanocrystalline TiN thin films are fabricated on Ti substrates by electrophoretic deposition in an aqueous suspension containing TiN powders at room temperature. X-ray diffraction confirms the formation of TiN films and the film color varies with deposition time. The current-time curves are recorded during deposition and the surface morphology and cross-sectional images are investigated by scanning electron microscopy (SEM). The film thickness is around 6.1 mu m after 10 min deposition and increases with deposition time. The adhesion strength is characterized by the ultrasonic vibration method and peel-off test. Our results suggest that electrophoretic deposition is a practical and facile technique to prepare nanocrystalline TiN films that are particularly suitable for the decorative coating industry. (C) 2009 Elsevier B.V. All rights reserved.