期刊
SURFACE & COATINGS TECHNOLOGY
卷 204, 期 4, 页码 418-422出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2009.07.039
关键词
Titanium nitride; Electrophoretic deposition; Thin films; Decorative coating
资金
- National 863 High-Tech Program of China [2006AA05Z121]
- National Science Foundation of China [20673028]
- Shanghai Pujiang Program
- State Key Laboratory Breeding Base of Photocatalysis, Fuzhou University [K-081018]
- Shanghai Leading Academic Discipline Project [B113]
- Hong Kong Research Grants Council (RGC) General Research Funds (GRF) [CityU 112608]
Homogeneous and adhesive nanocrystalline TiN thin films are fabricated on Ti substrates by electrophoretic deposition in an aqueous suspension containing TiN powders at room temperature. X-ray diffraction confirms the formation of TiN films and the film color varies with deposition time. The current-time curves are recorded during deposition and the surface morphology and cross-sectional images are investigated by scanning electron microscopy (SEM). The film thickness is around 6.1 mu m after 10 min deposition and increases with deposition time. The adhesion strength is characterized by the ultrasonic vibration method and peel-off test. Our results suggest that electrophoretic deposition is a practical and facile technique to prepare nanocrystalline TiN films that are particularly suitable for the decorative coating industry. (C) 2009 Elsevier B.V. All rights reserved.
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