☆ 4.6 Article

Method and mechanism of vapor phase treatment-total reflection X-ray fluorescence for trace element analysis on silicon wafer surface

SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY (2010)

主要评分表示论文的整体质量水平。次要评分独立反映论文的优点或缺点。

Discuss science. Find collaborators. Network.

Join a conversation

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now