期刊
SOLID-STATE ELECTRONICS
卷 58, 期 1, 页码 54-61出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.sse.2010.11.024
关键词
CBRAM; Solid electrolyte; Embedded non-volatile memory; Electrodeposition; CMOS processing; Low power
One of the promising technologies under development for next generation non-volatile memory is the Conductive Bridging Random Access Memory (CBRAM) which utilizes the reversible switching of an electro-resistive dielectric between two conductive states as means of storing logical data [1-7]. In this paper, we describe the successful integration of CBRAM technology into an industry standard logic process. Moreover, we show functional operation of such a fully CMOS integrated CBRAM memory array and highlight its specific fundamental low power characteristics that make it suitable to be used in scaled embedded application as well as discrete devices. (C) 2010 Elsevier Ltd. All rights reserved.
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