4.4 Article

Graphene growth on h-BN by molecular beam epitaxy

期刊

SOLID STATE COMMUNICATIONS
卷 152, 期 12, 页码 975-978

出版社

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.ssc.2012.04.005

关键词

Graphene; Molecular beam epitaxy; Raman spectroscopy; AFM

资金

  1. ONR [N000140610138, Graphene MURI]
  2. AFOSR [FA9550-11-1-0010]
  3. EFRC Center for Re-Defining Photovoltaic Efficiency through Molecule Scale Control [DE-SC0001085]
  4. NSF [CHE-0641523]
  5. NYSTAR
  6. CSIC-PIF [2009501154]
  7. Spanish CAM [Q&C Light (S2009ESP-1503), Numancia 2 (S2009/ENE-1477)]
  8. Spanish MEC [ENE2009-14481-C02-02, TEC2011-29120-C05-04, MAT2011-26534]
  9. Grants-in-Aid for Scientific Research [24651148, 23310096] Funding Source: KAKEN

向作者/读者索取更多资源

The growth of single layer graphene nanometer size domains by solid carbon source molecular beam epitaxy on hexagonal boron nitride (h-BN) flakes is demonstrated. Formation of single-layer graphene is clearly apparent in Raman spectra which display sharp optical phonon bands. Atomic-force microscope images and Raman maps reveal that the graphene grown depends on the surface morphology of the h-BN substrates. The growth is governed by the high mobility of the carbon atoms on the h-BN surface, in a manner that is consistent with van der Waals epitaxy. The successful growth of graphene layers depends on the substrate temperature, but is independent of the incident flux of carbon atoms. (C) 2012 Elsevier Ltd. All rights reserved.

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