期刊
AIP ADVANCES
卷 5, 期 12, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.4938126
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资金
- Japan Society for the Promotion of Science [15H03967]
- Grants-in-Aid for Scientific Research [15H03967] Funding Source: KAKEN
We investigated the effect of thermal oxidation on crystalline faults in 4H-SiC epilayers using photoluminescence imaging. We found that a comb-shaped dislocation array was deformed by thermal oxidation. We also found that line-shaped faults perpendicular to the off-cut direction were formed during oxidation and were stretched and increased with the oxidation time. Since these line-shaped faults were peculiar to the oxidation and stretched/increased with the oxide growth, they were identified as oxidation-induced stacking faults as seen in Si oxidation. (C) 2015 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.
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