期刊
SOLAR ENERGY
卷 83, 期 5, 页码 753-760出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.solener.2008.11.006
关键词
CuInSe2 thin film; Thermal evaporation; X-ray diffraction; Energy dispersive X-ray analysis; Atomic force microscopy; Transmission measurements
资金
- University Grants Commission (UGC), New Delhi, India
Copper indium diselenide (CuInSe2) compound was synthesized by reacting its constituent's elements copper, indium and selenium in near stoichiometric proportions (i.e. 1:1:2 with 5% excess selenium) in an evacuated quartz ampoule. Synthesized pulverized compound material was used as an evaporant material to deposit thin films of CuInSe2 onto organically cleaned sodalime glass substrates, held at different temperatures (300-573 K), by means of single source thermal evaporation method. The phase structure and the composition of chemical constituents present in the synthesized compound and thin films have been investigated using X-ray diffraction and energy dispersive X-ray analysis, respectively. The investigations show that CuInSe2 thin films grown above 423 K are single phase, having preferred orientation of grains along the (112) direction, and having near stoichiometric composition of elements. The surface morphology of CuInSe2 films, deposited at different substrate temperatures, has been studied using the atomic force microscopy to estimate its surface roughness. An analysis of the transmission spectra of CuInSe2 films, recorded in the wavelength range of 500-1500 nm, revealed that the optical absorption coefficient and the energy band gap for CuInSe2 films, deposited at different substrate temperatures, are similar to 10(4) cm(-1) and 1.01-1.06 eV, respectively. The transmission spectrum was analyzed using iterative method to calculate the refractive index and the extinction coefficient of CuInSe2 thin film deposited at 523 K. The Hall effect measurements and the temperature dependence of the electrical conductivity of CuInSe2 thin films, deposited at different substrate temperatures, revealed that the films had electrical resistivity in the range of 0.15-20 ohm cm, and the activation energy 82-42 meV, both being influenced by the substrate temperature. (C) 2008 Elsevier Ltd. All rights reserved.
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