4.6 Review

From soft to hard: the generation of functional and complex colloidal monolayers for nanolithography

期刊

SOFT MATTER
卷 8, 期 15, 页码 4044-4061

出版社

ROYAL SOC CHEMISTRY
DOI: 10.1039/c1sm06650a

关键词

-

向作者/读者索取更多资源

Take polymer colloids-simple to make and ubiquitously available-let them self-assemble into a monolayer and you have, readily engineered, a sophisticated mask to create highly symmetric surface patterns with nanometre precision. Thirty years after its invention, this process, commonly referred to as colloidal lithography, is far from being old news and an ever-increasing range of scientists continues to use their creativity to come up with increasingly more complex surface patterns. As intriguing this technique is, the devil is in the details and it is far from trivial to achieve high order in a colloidal monolayer. This article reviews available crystallization techniques and discusses their scope and limitations in order to provide just the right method for your next experiment.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据