期刊
SOFT MATTER
卷 8, 期 2, 页码 465-471出版社
ROYAL SOC CHEMISTRY
DOI: 10.1039/c1sm06431b
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资金
- National Research Foundation of Korea (NRF)
- Ministry of Education, Science and Technology, CLEA, NCRC [R15-2008-006-03002-0]
- MKE/KEIT [10030559]
We develop an innovative solution processable edge lithography, which we call double-dewetting edge lithography (DDEL). The polymer solution spontaneously dewets the hydrophobic regions and covers only hydrophilic regions on a surface energy-engineered substrate, which is achieved by a combination of conventional photolithography and a subsequent hydrophobic treatment of the exposed areas. Then, the secondary dewetting occurs through a coffee stain effect during the solvent evaporation, leaving polymer edge patterns behind. The whole double-dewetting phenomenon is complete within 1 s. This technique is a fast, cost-effective and easy direct solution patterning method, which enables nanoscale polymer edge patterns to be produced from various micron-scale platforms including lines, angular and irregular shapes.
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