期刊
SMALL
卷 9, 期 22, 页码 3778-3783出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/smll.201300168
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资金
- National Science Foundation [ECCS-0901383, ECCS-0925759, CNS-1126688]
- Defense Advanced Research Project Agency [N66001-08-1-2037]
- Air Force Office of Scientific Research [FA9550-08-1-0379]
- CAS International Collaboration and Innovation Program on High Mobility Materials Engineering
- Div Of Electrical, Commun & Cyber Sys
- Directorate For Engineering [0901383] Funding Source: National Science Foundation
Metal nanostructures are the main building blocks of metamaterials and plasmonics which show many extraordinary properties not existing in nature. A simple and widely applicable method that can directly pattern metals with silicon molds without the need of resists, using pressures of <4 MPa and temperatures of 25-150 degrees C is reported. Three-dimensional structures with smooth and vertical sidewalls, down to sub-10 nm resolution, are generated in silver and gold films in a single patterning step. Using this nanopatterning scheme, large-scale vivid images through extraordinary optical transmission and strong surface-enhanced Raman scattering substrates are realized. Resistless nanoimprinting in metal (RNIM) is a new class of metal patterning that allows plasmonic nanostructures to be fabricated quickly, repeatedly, and at a low-cost.
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