期刊
SENSORS AND ACTUATORS B-CHEMICAL
卷 154, 期 2, 页码 283-287出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.snb.2010.01.010
关键词
Nanorods; Plasma-enhanced chemical vapour deposition (PECVD); SnO2; Gas sensors
SnO2 nanorods were successfully deposited on 3 Si/SiO2 wafers by inductively coupled plasma-enhanced chemical vapour deposition (PECVD) and a wafer-level patterning of nanorods layer for miniaturized solid state gas sensor fabrication were performed. Uniform needle-shaped SnO2 nanorods in situ grown were obtained under catalyst- and high temperature treatment-free growth condition. These nanorods have an average diameter between 5 and 15 nm and a length of 160-300 nm. The SnO2-nanorods based gas sensors were tested towards NH3 and CH3OH and gas sensing tests show remarkable response, showing promising and repeatable results compared with the SnO2 thin films gas sensors. (C) 2010 Elsevier B.V. All rights reserved.
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