期刊
SEMICONDUCTORS
卷 48, 期 7, 页码 875-882出版社
MAIK NAUKA/INTERPERIODICA/SPRINGER
DOI: 10.1134/S1063782614070161
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A method for determination of the diffusion length L (de) of minority charge carriers in a semiconductor from the dynamic nonequilibrium I-V characteristics of metal-insulator-semiconductor (MIS) structures is proposed. The method makes it possible to exclude the effect of bulk generation in a semiconductor on L (de) and decrease the temperature of measurements. The possibility of investigating the effective L (de) profile in the semiconductor surface layer is shown for the case of nonuniform depth distribution of electrically active defects in a material. The values of L (de) in MIS structures on silicon used in integrated-circuit technology are investigated. The effect of the internal gettering of defects in silicon and the irradiation of MIS structures by low-energy electrons (10-30 keV) on the effective L (de) profiles in the surface layer of a semiconductor is considered.
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