Study on quaternary AlInGaN/GaN HFETs grown on sapphire substrates

We report on AlInGaN/GaN heterostructure field effect transistors (HFETs) and the effect of different barrier material compositions. The analytical model for the interface charge in quaternary nitride heterostructures is described in detail and is applied in the calculation of the expected sheet carrier density. Experimental results from different lattice-matched AlInGaN/GaN heterostructures are presented and compared with the analytical predictions. Three heterostructures with AlInGaN barriers grown on sapphire substrates were processed and have been investigated. Each barrier layer was lattice-matched to GaN and the gallium content was 0.1, 0.15 and 0.2 at a barrier thickness of 13.5, 12.8 and 11.3 nm, respectively. Additionally, from these experiments, the basic trends for quaternary nitride Schottky barrier contacts are discussed. Finally, comprehensive dc characterizations have been performed. All devices had a gate length of 1 mu m and exhibited a good transconductance of around 260 mS mm(-1) at nearly the same current density level. An increase in threshold voltage as well as a decrease in gate leakage current for increasing GaN content has been observed. The nearly constant electron mobility in the range of 1700 cm(2) V(-1) s(-1) at room temperature is within the best reported so far for HFETs with InN-containing barriers.