期刊
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
卷 24, 期 2, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.1088/0268-1242/24/2/025025
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- SIP-IPN [2006216]
- COFAA-IPN
- PIFI-IPN
- government of Mexico through the Ministry of Foreign Affairs
Near-stoichiometric bismuth telluride (Bi2Te3) and antimony telluride (Sb2Te3) films were grown by the close space vapor transport (CSVT) method in a relatively simple fashion. The dependence of the film properties on the substrate temperature was explored over a wide range by keeping the source-to-substrate thermal gradient fixed at 300 degrees C and 350 degrees C for the Bi2Te3 and Sb2Te3 film growth, respectively. A Seebeck coefficient (alpha) of 255 mu V K-1 and a power factor of 20.5 x 10(-4) W K-2 m(-1) were obtained for Bi2Te3 at a substrate temperature of 350 degrees C; meanwhile, the maxima of the above parameters for the antimony telluride films (108 mu V K-1 and 3.8 x 10(-4) W K-2 m(-1), respectively) were reached at a substrate temperature of 450 degrees C.
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