4.7 Article

Application of sputtered ruthenium nitride thin films as electrode material for energy-storage devices

期刊

SCRIPTA MATERIALIA
卷 68, 期 9, 页码 659-662

出版社

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.scriptamat.2013.01.030

关键词

Electrode material; Ruthenium nitride; Structure; Reactive sputtering

资金

  1. ANR (Agence Nationale de la Recherche)-Advanced-NIBACA [ANR-09-Stock-E-01]

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RuN films that crystallized in the ZnS-like structure with [111] preferred orientation have been deposited by reactive sputtering. Preliminary results are reported on the electrochemical properties of such films as electrode materials for supercapacitors and lithium-ion batteries. Cyclic voltammetric experiments indicate an attractive capacitance value of 37 F g(-1). Moreover, galvanostatic measurements indicate that RuN films reversibly react with lithium through a conversion reaction with Ru(0) nanoparticle formation. A high capacity value of similar to 700 mAh g(-1) at C/2 rate is achievable. (C) 2013 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

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