4.7 Article

Improvement in the mechanical performance of Czochralski silicon under indentation by germanium doping

期刊

SCRIPTA MATERIALIA
卷 64, 期 9, 页码 832-835

出版社

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.scriptamat.2011.01.014

关键词

Silicon; Nanoindentation; Phase transformation; Raman spectroscopy; Germanium doping

资金

  1. Natural Science Foundation of China [50832006, 60876001, 60906001, 50672085]
  2. Program PCS1T
  3. Program 973 [2007CB613403]
  4. Research Fund for the Doctoral Program of Higher Education [200803350043]
  5. DOE, Office cif Science and Office of Basic Energy Sciences [DE-SC0001057]
  6. Center for Nanoscale Materials at ANL [DE-AC02-06CH11357]

向作者/读者索取更多资源

The mechanical properties of germanium-doped Czochralski (GCz) silicon have been investigated using instrumented nanoindentation combined with an ultrasonic pulse-echo overlap technique. The GCz silicon samples showed higher Young's modulus and hardness than germanium-free Czochralski silicon samples in nanoindentation tests. We believe this was caused by the enhanced phase transition from the Si-I phase to the stiffer Si-II phase in GCz silicon under contact load during indentation. This scenario was further confirmed by micro-Raman spectroscopy measurements. (C) 2011 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

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