期刊
SCRIPTA MATERIALIA
卷 63, 期 1, 页码 24-27出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.scriptamat.2010.02.040
关键词
Metallic thin film; Nickel and platinum silicides; Interfacial reaction; In-situ X-ray reflectivity
Ni(13%Pt)/Si( 1 0 0) samples were studied during post-deposition annealing using in-situ X-ray reflectivity and diffraction. The fast Fourier transform of the reflectivity data shows the formation of a single phase during the first stages of reaction, and allows a unique determination of the Pilling and Bedworth ratio of this phase. Both X-ray reflectivity and diffraction data were fitted using a diffusion growth law to extract the kinetic parameters. The results suggest that this first growing phase is the metastable hexagonal theta-Ni(2)Si. (C) 2010 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
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