期刊
SCRIPTA MATERIALIA
卷 62, 期 9, 页码 709-712出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.scriptamat.2010.01.037
关键词
Titanium; Thin films; Sputtering; Hydrogen; Stress
类别
资金
- Alexander von Humboldt foundation
The effect of residual hydrogen, sorbed during the deposition process, on the hydrogenation behavior of ion-beam sputtered titanium thin films was investigated. Electromotive force and in situ stress measurements were conducted to study hydrogen absorption, phase boundaries and hydrogen-induced stress development in the Ti-H thin film system. Tests were conducted on both as-sputtered and previously discharged films; the effect of residual hydrogen is significantly manifested in the thermodynamic isotherms and stress-concentration curves. (C) 2010 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
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