4.7 Article

The effect of residual hydrogen on hydrogenation behavior of titanium thin films

期刊

SCRIPTA MATERIALIA
卷 62, 期 9, 页码 709-712

出版社

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.scriptamat.2010.01.037

关键词

Titanium; Thin films; Sputtering; Hydrogen; Stress

资金

  1. Alexander von Humboldt foundation

向作者/读者索取更多资源

The effect of residual hydrogen, sorbed during the deposition process, on the hydrogenation behavior of ion-beam sputtered titanium thin films was investigated. Electromotive force and in situ stress measurements were conducted to study hydrogen absorption, phase boundaries and hydrogen-induced stress development in the Ti-H thin film system. Tests were conducted on both as-sputtered and previously discharged films; the effect of residual hydrogen is significantly manifested in the thermodynamic isotherms and stress-concentration curves. (C) 2010 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.7
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据