An instrument for 3D x-ray nano-imaging

We present an instrument dedicated to 3D scanning x-ray microscopy, allowing a sample to be precisely scanned through a beam while the angle of x-ray incidence can be changed. The position of the sample is controlled with respect to the beam-defining optics by laser interferometry. The instrument achieves a position stability better than 10 nm standard deviation. The instrument performance is assessed using scanning x-ray diffraction microscopy and we demonstrate a resolution of 18 nm in 2D imaging of a lithographic test pattern while the beam was defined by a pinhole of 3 mu m in diameter. In 3D on a test object of copper interconnects of a microprocessor, a resolution of 53 nm is achieved. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4737624]