期刊
REVIEW OF SCIENTIFIC INSTRUMENTS
卷 80, 期 7, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3186059
关键词
electric resistance measurement; electrical conductivity measurement; electrical resistivity; electron collisions; metallic thin films
资金
- Foundation for Science and Technology [POCI/DG/CTM/63888/2006]
In this article, a method to measure the electrical resistivity/conductivity of metallic thin films during layer growth on specific underlayers is described. The in situ monitoring of an underlayer electrical resistance, its change upon the incoming of new material atoms/molecules, and the growth of a new layer are presented. The method is easy to implement and allows obtaining in situ experimental curves of electrical resistivity dependence upon film thickness with a subatomic resolution, providing insight in film growth microstructure characteristics, specular/diffuse electron scattering surfaces, and optimum film thicknesses.
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