期刊
POLYMER TESTING
卷 27, 期 1, 页码 75-83出版社
ELSEVIER SCI LTD
DOI: 10.1016/j.polymertesting.2007.09.002
关键词
surface modification; X-ray photoelectron spectroscopy (XPS); contact angle; atomic force microscopy (AFM); low-pressure plasma; polyurethane film
In this work, low-pressure nitrogen plasma has been used to improve wettability in a polyurethane film. Evaluation of wettability changes has been carried out using contact angle measurements. Furthermore, plasma-treated films have been subjected to air aging to evaluate the extent of hydrophobic recovery. X-ray photoelectron spectroscopy (XPS) has been used to study surface functionalization; surface topography changes related with the etching mechanism have been followed by scanning electron microscopy (SEM), atomic force microscopy (AFM) and weight loss study. The results show a considerable improvement in surface wettability even for short exposure times, as observed by a remarkable decrease in contact angle values. The aging study shows a partial hydrophobic recovery due to the re-arrangement of polar species and migration of low molecular oxidized material (LMWOM). In addition to surface activation, SEM and AFM analyses show slight changes in surface topography as a consequence of the plasma-etching mechanism. (C) 2007 Elsevier Ltd. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据