4.7 Article

Study of process parameters and formative mechanism of patterns on a dip-pen nanolithography array using molecular dynamics simulations

期刊

POLYMER
卷 53, 期 3, 页码 857-863

出版社

ELSEVIER SCI LTD
DOI: 10.1016/j.polymer.2011.12.037

关键词

Dip-pen nanolithography; SAM; Array

资金

  1. National Science Council of Taiwan [NSC-100-2628-E-151-003-MY3, NSC-100-2221-E-151-018-MY3]

向作者/读者索取更多资源

The process parameters, pattern transfer mechanism, and pattern characterizations of alkanethiol self-assembled monolayers (SAMs) on a dip-pen nanolithography array are studied using molecular dynamics simulations. The effects of the type of probe tip, distance between probe tips, deposition temperature, probe tip velocity, probe tip radius, and humidity are evaluated in terms of molecular transference, alkanethiol meniscus characteristics, surface adsorption energy, number of transferred chains, and pattern characteristics. The simulation results clearly show that the molecular transfer ability of a conical tip array is better than that of a pyramidal tip array. For a conical tip array, the number of transferred chains increases with decreasing distance between tips, whereas for a pyramidal tip array, the number of transferred chains decreases. When the deposition temperature increases, the number of transferred molecules, the size of the pattern deposited on the substrate, and the density of molecular packing significantly increase due to an increase in molecular kinetic energy. The number of transferred chains significantly decreases with increasing tip velocity. The number of transferred molecules and meniscus size increase with increasing humidity. (C) 2011 Elsevier Ltd. All rights reserved.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.7
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据