期刊
PLASMA SOURCES SCIENCE & TECHNOLOGY
卷 23, 期 6, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.1088/0963-0252/23/6/062002
关键词
electron energy distribution; pulsed plasma; plasma parameter; plasma control
资金
- National RD Program [2014M1A7A1A03045185]
- SRC [2011-0000845]
- CRC [2012K001238]
- Research Foundation of Korea (NRF) - Korea government (MEST) [2013R1A1A2061730, 2013R1A6A3A01022941]
Drastic changes in the electron energy distribution (EED) and the plasma parameter caused by a pulse-modulated (PM) inductive field were observed in a low-gas pressure capacitively coupled plasma (CCP). By applying a small amount of the PM inductive power (20 W) in the CCP, the effective electron temperature (T-eff) was increased without a variation of the plasma density (n(e)) due to the low energy electron heating by the inductive field. When a large amount of the PM inductive power of 50 W was applied to the CCP, both the T-eff and the n(e) were increased because of the electron heating through the coupling effect of the inductive and capacitive fields. These results show that T-eff and n(e) can be controlled independently or simultaneously in the plasmas by adding the pulse inductive field.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据