期刊
PLASMA SOURCES SCIENCE & TECHNOLOGY
卷 22, 期 1, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.1088/0963-0252/22/1/015022
关键词
-
资金
- IT R&D Program of MKE [2009-S-007-1]
- World Class University program of the National Research Foundation of Korea [R32-2008-000-10124-0]
- Ministry of Education, Science and Technology [2010-0015035]
- National Research Foundation of Korea [R32-2012-000-10124-0] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
Using a radio frequency (RF) compensated Langmuir probe, modulations in electron energy distribution (EED) and plasma potential are investigated in a discharge produced by a large-area dual frequency/dual antenna inductively coupled plasma source. The discharge is ignited using two frequencies (2 and 13.56 MHz). It is observed that the EEDs can be tailored by varying the power ratio of the two frequencies. Increasing the power level of the low frequency (P-2 (MHz)) enhances the population density of high-energy electrons; however, increasing the high-frequency power (P-13.56 (MHz)) increases the low-energy electron population density. At a fixed total power (P-2 MHz + P-13.56 (MHz)), the higher the low-frequency power (P-2 MHz) content, the higher the population density of high-energy electrons; however, this trend reverses with high-frequency power (P-13.56 (MHz)). The influence of power ratio on plasma density (n(e)), plasma temperature (T-e) and plasma potential (V-p) has also been studied. It is found out that the plasma parameters have similar trends with RF power irrespective of its frequency. The value of n(e) increases, and T-e and V-p decrease with increasing power. At a fixed P-2 MHz, V-p increases with increasing P-13.56 (MHz). However, V-p decreases with increasing P-2 MHz at a fixed value of P-13.56 (MHz).
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据