期刊
PLASMA SOURCES SCIENCE & TECHNOLOGY
卷 21, 期 4, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.1088/0963-0252/21/4/045009
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资金
- National Natural Science Foundation of China [11075093, 10935006]
- China Postdoctoral Science Foundation [20100480327]
The spatial evolution of the electron energy distribution function (EEDF) in the axial direction of a capacitively coupled plasma with two parallel plate electrodes is investigated using an optical emission line-ratio method for Ar/Kr discharges. When the rf power is increased from 25 to 400 W at a pressure of 400 mTorr, we observe a transition from convex EEDFs to concave ones and a sharp increase in electron density, due to an alpha-gamma mode transition, which is believed to be caused by the high-energy electrons originating in the high-voltage sheath. We also investigate the spatial evolution of the EEDF when the pressure is increased from 45 to 500 mTorr at a power of 100W. The EEDF is uniform at pressures below 180 mTorr and becomes non-uniform at higher pressures, owing to the decrease in the energy relaxation length of the high-energy electrons.
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