期刊
PLASMA PROCESSES AND POLYMERS
卷 10, 期 2, 页码 167-180出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/ppap.201200087
关键词
etching; lipid A; radicals; VUV irradiation
资金
- US Department of Energy [DESC0005105]
- National Science Foundation [PHY-1004256]
- Direct For Mathematical & Physical Scien
- Division Of Physics [1004256] Funding Source: National Science Foundation
It is widely accepted that plasma-generated energetic and reactive species are responsible for plasma-induced sterilization; however, how these species act alone or synergistically to deactivate endotoxic biomolecules is not completely understood. Using a vacuum beam system, we study the effects of vacuum ultraviolet (VUV) radiation, oxygen and deuterium radicals on lipid A, the immune-stimulating region of lipopolysaccharide. VUV-induced photolysis causes bulk modification of exposed lipid A film up to the penetration depth of VUV photons, approximate to 200nm. Although radical-induced etch yield of lipid A is lower than VUV-induced photolysis, secondary ion mass spectrometry and human whole blood-based assay suggest that radicals render a higher degree of modification at the film surface. This study contributes to the fundamental understanding of plasma effects on biomolecules for a better deactivation scheme and applications.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据