期刊
PLASMA PROCESSES AND POLYMERS
卷 9, 期 4, 页码 435-445出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/ppap.201100184
关键词
deposition kinetics; FTIR; plasma copolymerisation; surface functionalisation; XPS
资金
- Luxembourgish 'Fonds National de la Recherche' (FNR)
Tuning of the electrical parameter (e.g. power and pulsed discharge) of an Atmospheric Pressure Dielectric Barrier Discharge (AP-DBD) plasma of Maleic Anhydride (MA) and vinyltrimethoxysilane (VTMOS) allows the formation of coatings with different combination of anhydride/carboxylic group surface density, morphology and deposition rate. Pulsing of the discharge favours the incorporation of MA with a high structural retention, leading to coatings with a chemical composition similar to the expected conventional MA-VTMOS copolymer one. A kinetic model based on the free radical polymerisation is developed to correlate the carboxylic groups density on the plasma functionalised surface and the duration of the plasma off-time.
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