期刊
PLASMA PROCESSES AND POLYMERS
卷 8, 期 5, 页码 367-372出版社
WILEY-BLACKWELL
DOI: 10.1002/ppap.201000140
关键词
allylamine; n-heptylamine; plasma polymerisation; surface morphology; thin films
资金
- Australian Research Council [DP0987821]
- Australian Research Council [DP0987821] Funding Source: Australian Research Council
The manner by which plasma polymers grow in the very first stages of deposition is a topic which has been almost overlooked. We show using atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) that in the early stages of plasma deposition there are significant differences in the way plasma polymers grow from two amine-containing compounds onto silicon wafers. By AFM it is shown that films grown from n-heptylamine (HA) initially show 'island-like' growth before a continuous smooth film is formed. In contrast, films from allylamine grow smoothly from the very earliest stages. XPS data show substantial differences of plasma polymer chemistry in close proximity to the silicon surface manifested in the formation of NH(3)(+) and NO(x) species which are more abundant in films of HA. We present a possible explanation for these results based upon post-plasma surface phenomena in the case of HA.
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