期刊
PLASMA PROCESSES AND POLYMERS
卷 7, 期 11, 页码 889-898出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/ppap.200900144
关键词
ablation; deposition; R F plasma; specific energy
Regarding the recent debate on the usefulness of macroscopic kinetics for plasma polymerization, we further investigated the deposition of oxygen-containing functional plasma polymers based on low pressure CO2/C2H4 RF discharges in order to find differences and transitions in the growth mechanism. A reduction in deposition rate with increasing CO2/C2H4 ratio and a drop in deposition rate at enhanced energy input have been observed. Both effects are found to be mainly related to plasma-chemical processes such as the production of film-forming species and oxidation in the gas phase. In contrast to plasma etching with non-polymerizing gases, ion-enhanced etching effects were found to play a secondary role for the deposition of oxygen-containing functional plasma polymers.
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