期刊
PLASMA PROCESSES AND POLYMERS
卷 6, 期 3, 页码 161-169出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/ppap.200800129
关键词
ionic physical vapor deposition; monte carlo simulation; nanodots; nanofabrication; ZnO
资金
- National Science Foundation of China [10405017]
- Australian Research Council, CSIRO
- International Research Network for Deterministic Plasma Aided Nanofabrication
The results of multi-scale numerical simulations of pulsed i-PVD template-assisted nanofabrication of ZnO nanodot arrays on a silicon substrate are presented. The ratios and spatial distributions of the ion fluxes deposited on the lateral and bottom surfaces of the nanopores are computed as a function of the external bias and plasma parameters. The results show that the pulsed bias plays a significant role in the ion current distribution inside the nanopores. The results of numerical experiments of this work suggest that by finely adjusting the pulse voltage, the pulse duration and the duty cycle of the external pulsed bias, the nanopore clogging can be successfully avoided during the deposition and the shapes of the deposited ZnO nanodots can be effectively controlled.
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