Optical Transverse Injection in Laser-Plasma Acceleration

Laser-wakefield acceleration constitutes a promising technology for future electron accelerators. A crucial step in such an accelerator is the injection of electrons into the wakefield, which will largely determine the properties of the extracted beam. We present here a new paradigm of colliding-pulse injection, which allows us to generate high-quality electron bunches having both a very low emittance (0: 17 mm . mrad) and a low energy spread (2%), while retaining a high charge (similar to 100 pC) and a short duration (3 fs). In this paradigm, the pulse collision provokes a transient expansion of the accelerating bubble, which then leads to transverse electron injection. This mechanism contrasts with previously observed optical injection mechanisms, which were essentially longitudinal. We also specify the range of parameters in which this new type of injection occurs and show that it is within reach of existing high-intensity laser facilities.