4.8 Article

Anisotropic Crystalline Organic Step-Flow Growth on Deactivated Si Surfaces

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PHYSICAL REVIEW LETTERS
卷 110, 期 8, 页码 -

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AMER PHYSICAL SOC
DOI: 10.1103/PhysRevLett.110.086107

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  1. U. S. Department of Energy (DOE) Office of Science Early Career Research Program through the Office of Basic Energy Sciences [DE-SC0006400]
  2. Michigan State University
  3. U.S. Department of Energy (DOE) [DE-SC0006400] Funding Source: U.S. Department of Energy (DOE)

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We report the first demonstration of anisotropic step-flow growth of organic molecules on a semiconducting substrate using metal phthalocyanine thermally deposited on the deactivated Si(111)-B root 3 x root 3 p R30 degrees surface. With scanning probe microscopy and geometric modeling, we prove the quasiepitaxial nature of this step-flow growth that exhibits no true commensurism, despite a single dominant long-range ordered relationship between the organic crystalline film and the substrate, uniquely distinct from inorganic epitaxial growth. This growth mode can likely be generalized for a range of organic molecules on deactivated Si surfaces and access to it offers new potential for the integration of ordered organic thin films in silicon-based electronics. DOI: 10.1103/PhysRevLett.110.086107

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