4.8 Article

High-Fidelity Conformation of Graphene to SiO2 Topographic Features

期刊

PHYSICAL REVIEW LETTERS
卷 105, 期 21, 页码 -

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AMER PHYSICAL SOC
DOI: 10.1103/PhysRevLett.105.215504

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  1. University of Maryland NSF-MRSEC [DMR 05-20471]
  2. NRI
  3. U.S. ONR MURI

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High-resolution noncontact atomic force microscopy of SiO2 reveals previously unresolved roughness at the few-nm length scale, and scanning tunneling microscopy of graphene on SiO2 shows graphene to be slightly smoother than the supporting SiO2 substrate. A quantitative energetic analysis explains the observed roughness of graphene on SiO2 as extrinsic, and a natural result of highly conformal adhesion. Graphene conforms to the substrate down to the smallest features with nearly 99% fidelity, indicating conformal adhesion can be highly effective for strain engineering of graphene.

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