期刊
PHYSICAL REVIEW E
卷 79, 期 5, 页码 -出版社
AMER PHYSICAL SOC
DOI: 10.1103/PhysRevE.79.051605
关键词
random processes; surface diffusion
We discuss a parameter-free scaling relation that yields a complete data collapse for large classes of nonequilibrium growth processes. We illustrate the power of this scaling relation through various growth models, such as the competitive growth model with random deposition and random deposition with surface diffusion or the restricted solid-on-solid model with different nearest-neighbor height differences, as well as through a deposition model with temperature-dependent diffusion. The scaling relation is compared to the familiar Family-Vicsek relation, and the limitations of the latter are highlighted.
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