期刊
PHYSICAL REVIEW B
卷 90, 期 6, 页码 -出版社
AMER PHYSICAL SOC
DOI: 10.1103/PhysRevB.90.060505
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资金
- Polish NSC [2011/01/B/ST3/00462]
- NSF [DMR 1262253]
- French-Polish Bilateral Program PICS
- ERDF Project [POIG.02.01-00-14-032/08]
- ERDF Project NanoFun [POIG.02.02.00-00-025/09]
Structural and transport properties of thin Nb layers in Si/Nb/Si trilayers with Nb layer thickness d from 1.1 nm to 50 nm have been studied. With decreasing thickness, the structure of the Nb layer changes from polycrystalline to amorphous at d similar or equal to 3.3 nm, while the superconducting temperature T-c monotonically decreases. The Hall coefficient varies with d systematically but changes sign into negative in ultrathin films with d < 1.6 nm. The influence of boundary scattering on the relaxation rate of carriers, and band broadening in the amorphous films, may contribute to this effect.
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