4.6 Article

Epitaxy-distorted spin-orbit Mott insulator in Sr2IrO4 thin films

期刊

PHYSICAL REVIEW B
卷 87, 期 8, 页码 -

出版社

AMER PHYSICAL SOC
DOI: 10.1103/PhysRevB.87.085121

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资金

  1. DOD
  2. Air Force Office of Scientific Research
  3. National Defense Science and Engineering Graduate (NDSEG) Fellowship [32 CFR 168a]
  4. NSF Center for Energy Efficient Electronics Science (E3S)
  5. Spanish Ministerio de Economia y Competitividad [MAT2009-07967, CSD2007-00041]
  6. Grant Agency of the Czech Republic [P204/11/P339]
  7. Praemium Academiae of the Academy of Sciences of the Czech Republic [268066]
  8. DOD-ARO MURI
  9. E3S
  10. DARPA

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High-quality epitaxial thin films of J(eff) = 1/2 Mott insulator Sr2IrO4 with increasing in-plane tensile strain have been grown on top of SrTiO3(001) substrates. Increasing the in-plane tensile strain up to similar to 0.3% was observed to drop the c/a tetragonality by 1.2%. X-ray absorption spectroscopy detected a strong reduction of the linear dichroism upon increasing in-plane tensile strain towards a reduced anisotropy in the local electronic structure. While the most relaxed thin film shows a consistent dependence with previously reported single crystal bulk measurements, electrical transport reveals a charge gap reduction from 200 meV down to 50 meV for the thinnest and most epitaxy-distorted film. We argue that the reduced tetragonality plays a major role in the change of the electronic structure, which is reflected in the change of the transport properties. Our work opens the possibility for exploiting epitaxial strain as a tool for both structural and functional manipulation of spin-orbit Mott systems. DOI: 10.1103/PhysRevB.87.085121

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