4.6 Article

Thickness-dependent bulk properties and weak antilocalization effect in topological insulator Bi2Se3

期刊

PHYSICAL REVIEW B
卷 84, 期 7, 页码 -

出版社

AMER PHYSICAL SOC
DOI: 10.1103/PhysRevB.84.073109

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资金

  1. IAMDN of Rutgers University
  2. National Science Foundation [NSF DMR-0845464]
  3. Office of Naval Research [ONR N000140910749]
  4. Division Of Materials Research
  5. Direct For Mathematical & Physical Scien [845464] Funding Source: National Science Foundation

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We show that a number of transport properties in topological insulator (TI) Bi2Se3 exhibit striking thickness dependences over a range of up to five orders of thickness (3 nm-170 mu m). Volume carrier density decreased with thickness, presumably due to diffusion-limited formation of selenium vacancies. Mobility increased linearly with thickness in the thin film regime and saturated in the thick limit. The weak antilocalization effect was dominated by a single two-dimensional channel over two decades of thickness. The sublinear thickness-dependence of the phase coherence length suggests the presence of strong coupling between the surface and bulk states.

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