相关参考文献
注意：仅列出部分参考文献，下载原文获取全部文献信息。Density functional calculations on atomic and electronic structures of amorphous HfO2/Si(001) interface
G. H. Chen et al.
APPLIED PHYSICS LETTERS (2009)
yambo: An ab initio tool for excited state calculations
Andrea Marini et al.
COMPUTER PHYSICS COMMUNICATIONS (2009)
Band offsets of ultrathin high-κ oxide films with Si
Eric Bersch et al.
PHYSICAL REVIEW B (2008)
Band offsets at the Si/SiO2 interface from many-body perturbation theory
R. Shaltaf et al.
PHYSICAL REVIEW LETTERS (2008)
Accurate quasiparticle spectra from self-consistent GW calculations with vertex corrections
M. Shishkin et al.
PHYSICAL REVIEW LETTERS (2007)
Screened-exchange determination of the electronic properties of monoclinic, tetragonal, and cubic zirconia
J. E. Medvedeva et al.
PHYSICAL REVIEW B (2007)
Self-consistent GW calculations for semiconductors and insulators
M. Shishkin et al.
PHYSICAL REVIEW B (2007)
Density functional theory of high-k dielectric gate stacks
Alexander A. Demkov et al.
MICROELECTRONICS RELIABILITY (2007)
Atomic and electronic structure of amorphous and crystalline hafnium oxide: X-ray photoelectron spectroscopy and density functional calculations
T. V. Perevalov et al.
JOURNAL OF APPLIED PHYSICS (2007)
Crystal structure and band gap determination of HfO2 thin films
Marie C. Cheynet et al.
JOURNAL OF APPLIED PHYSICS (2007)
First-principles study of the valence band offset between silicon and hafnia
Blair R. Tuttle et al.
PHYSICAL REVIEW B (2007)
Structural, electronic, and optical properties of ZrO2 from ab initio calculations
J. C. Garcia et al.
JOURNAL OF APPLIED PHYSICS (2006)
Effect of spatial nonlocality on the density functional band gap
Myrta Gruning et al.
PHYSICAL REVIEW B (2006)
Density functionals from many-body perturbation theory:: The band gap for semiconductors and insulators
M Grüning et al.
JOURNAL OF CHEMICAL PHYSICS (2006)
First-principles calculations of structural and electronic properties of monoclinic hafnia surfaces
AB Mukhopadhyay et al.
PHYSICAL REVIEW B (2006)
Theoretical studies of solid-solid interfaces
S. Q. Wang et al.
CURRENT OPINION IN SOLID STATE & MATERIALS SCIENCE (2006)
Bonding and interface states of Si:HfO2 and Si:ZrO2 interfaces
PW Peacock et al.
PHYSICAL REVIEW B (2006)
Low-temperature polymorphs of ZrO2 and HfO2:: A density-functional theory study -: art. no. 144107
JE Jaffe et al.
PHYSICAL REVIEW B (2005)
First-principles study of ZrO2/Si interfaces:: Energetics and band offsets -: art. no. 045327
YF Dong et al.
PHYSICAL REVIEW B (2005)
Structural, electronic, and dielectric properties of ultrathin zirconia films on silicon
S Sayan et al.
APPLIED PHYSICS LETTERS (2005)
First principles calculations of structural, elastic and electronic properties of XO2 (X = Zr, Hf and Th) in fluorite phase
R Terki et al.
COMPUTATIONAL MATERIALS SCIENCE (2005)
A brief introduction to the ABINIT software package
X Gonze et al.
ZEITSCHRIFT FUR KRISTALLOGRAPHIE (2005)
First-principles exploration of alternative gate dielectrics:: Electronic structure of ZrO2/Si and ZrSiO4/Si interfaces -: art. no. 155329
R Puthenkovilakam et al.
PHYSICAL REVIEW B (2004)
Bonding, energies, and band offsets of Si-ZrO2 and HfO2 gate oxide interfaces -: art. no. 057601
PW Peacock et al.
PHYSICAL REVIEW LETTERS (2004)
Electronics of the SiO2/HfO2 interface by soft X-ray photoemission spectroscopy
O Renault et al.
SURFACE SCIENCE (2004)
First-principles investigation of high-κ dielectrics:: Comparison between the silicates and oxides of hafnium and zirconium (vol B 69, art no 184301, 2004) -: art. no. 099903
GM Rignanese et al.
PHYSICAL REVIEW B (2004)
An accurate determination of barrier heights at the HfO2/Si interfaces
R Puthenkovilakam et al.
JOURNAL OF APPLIED PHYSICS (2004)
Valence and conduction band offsets of a ZrO2/SiOxNy,/n-Si CMOS gate stack:: A combined photoemission and inverse photoemission study
S Sayan et al.
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS (2004)
Band alignment issues related to HfO2/SiO2/p-Si gate stacks
S Sayan et al.
JOURNAL OF APPLIED PHYSICS (2004)
Efficient hybrid density functional calculations in solids: Assessment of the Heyd-Scuseria-Ernzerhof screened Coulomb hybrid functional
J Heyd et al.
JOURNAL OF CHEMICAL PHYSICS (2004)
Electronic structure and electron energy-loss spectroscopy of ZrO2 zirconia -: art. no. 245116
LK Dash et al.
PHYSICAL REVIEW B (2004)
Energy-band alignments at ZrO2/Si, SiGe, and Ge interfaces
SJ Wang et al.
APPLIED PHYSICS LETTERS (2004)
First-principles investigation of high-κ dielectrics:: Comparison between the silicates and oxides of hafnium and zirconium -: art. no. 184301
GM Rignanese et al.
PHYSICAL REVIEW B (2004)
Chemistry and band offsets of HfO2 thin films for gate insulators
M Oshima et al.
APPLIED PHYSICS LETTERS (2003)
Fundamental optical absorption edge of undoped tetragonal zirconium dioxide
CR Aita et al.
APPLIED PHYSICS LETTERS (2003)
Theoretical evaluation of zirconia and hafnia as gate oxides for Si microelectronics
V Fiorentini et al.
PHYSICAL REVIEW LETTERS (2002)
First-principles computation of material properties: the ABINIT software project
X Gonze et al.
COMPUTATIONAL MATERIALS SCIENCE (2002)
Internal photoemission of electrons and holes from (100)Si into HfO2
VV Afanas'ev et al.
APPLIED PHYSICS LETTERS (2002)
Energy gap and band alignment for (HfO2)x(Al2O3)1-x on (100) Si
HY Yu et al.
APPLIED PHYSICS LETTERS (2002)
Nonlinear composition dependence of x-ray photoelectron spectroscopy and Auger electron spectroscopy features in plasma-deposited zirconium silicate alloy thin films
GB Rayner et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2002)
Characterization of ALCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy
H Nohira et al.
JOURNAL OF NON-CRYSTALLINE SOLIDS (2002)
Soft x-ray photoemission studies of the HfO2/SiO2/Si system
S Sayan et al.
APPLIED PHYSICS LETTERS (2002)
Quasiparticle electronic structure of copper in the GW approximation -: art. no 016403
A Marini et al.
PHYSICAL REVIEW LETTERS (2002)
Structure and electrical levels of point defects in monoclinic zirconia
AS Foster et al.
PHYSICAL REVIEW B (2001)
Characterization of ultrathin zirconium oxide films on silicon using photoelectron spectroscopy
S Miyazaki et al.
MICROELECTRONIC ENGINEERING (2001)
First-principles study of dynamical and dielectric properties of tetragonal zirconia
GM Rignanese et al.
PHYSICAL REVIEW B (2001)
High-κ gate dielectrics:: Current status and materials properties considerations
GD Wilk et al.
JOURNAL OF APPLIED PHYSICS (2001)
分享论文
