4.6 Article

Temperature dependence of resistivity and Hall coefficient in strongly disordered NbN thin films

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PHYSICAL REVIEW B
卷 80, 期 13, 页码 -

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AMER PHYSICAL SOC
DOI: 10.1103/PhysRevB.80.134514

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  1. U.S. DOE [DE-FG0207ER46420]

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We report the temperature dependence of resistivity (rho) and Hall coefficient (R(H)) in the normal state of homogeneously disordered epitaxial NbN thin films with k(F)l similar to 1.68-10.12. The superconducting transition temperature (T(c)) of these films varies from 2.7 to 16.8 K. While our least disordered film displays usual metallic behavior, for all the films with k(F)l <= 8.13, both d rho/dT and dR(H)/dT are negative up to 285 K. We observe that R(H)(T) varies linearly with rho(T) for all the films and [R(H)(T)-R(H)(285 K)/R(H)(285 K)] = gamma[rho(T)-rho(285 K)/rho(285 K)], where gamma=0.68 +/- 0.11. Measurements performed on a 2-nm-thick Be film show similar behavior with gamma=0.69. This behavior is inconsistent with existing theories of localization and e-e interactions in a disordered metal.

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